Chemical Deposition Method Preparing Monolayer Tungsten Disulfide
Monolayer tungsten disulfide is a kind of nano material with layered structure, it has better temperature stability than monolayer disulfide. It has attracted much attention in recent years because of its better optical and electrical properties, in the semiconductor field such as transistors, tungsten disulfide is an indirect bandgap semiconductor, forbidden band width is 2.0eV, it has more space than the application of graphene in the field of electronic tube. At present, the most important methods to prepare monolayer tungsten disulfide in China are three methods: RF sputtering, reactive magnetron sputtering and chemical deposition. In recent years, the research on the preparation of two-dimensional TMDCs by CVD(chemical vapor deposition) method is mainly focused on molybdenum disulfide, because MoS 2 requires lower temperature and it is easy to control the growth process, tungsten disulfide seems much more complex. There are two main ways to prepare tungsten disulfide fi...