RF Sputtering Method Preparing Nanometer Tungsten Disulfide Membrane
Tungsten disulfide is an excellent solid lubricant material, it has high application value in the field of super solid lubrication. Tungsten disulfide membrane have layered structure, it has lower hardness and better stability under high temperature, it is suitable to be used as a solid lubricant for friction parts in special environment. There are three main methods for preparing tungsten disulfide membrane which include RF sputtering method, reactive magnetron sputtering method, chemical deposition method. The method of RF sputtering crystal growth is the method of using RF sputtering to make the components of the crystal material gasified and then recrystallized to grow the crystal. RF sputtering is a sputtering deposition method suitable for all kinds of metal and nonmetal materials, the frequency range is 5~30MHz, the frequency of 13.56MHz is commonly used internationally. It is mainly used to prepare thin membranes and also to prepare small size crystals. WS2 powder with 99.99%