Preparation of Nano Tungsten Trioxide Thin Films by Electrodeposition
Nano tungsten trioxide is an excellent N-type semiconductor gas sensor, compared with the traditional materials, nano-tungsten trioxide gas sensor, high sensitivity, faster response speed and faster recovery is the most studied in recent years gas sensitive raw materials.
There are methods for the synthesis of nano tungsten oxide films or gas phase method and solid phase method, liquid phase method. Electrodeposition is a gas phase method for preparing nano tungsten trioxide thin film, it is in a certain electrolyte and operating conditions, the metal or alloy from the compound solution, non aqueous solution or molten salt electrochemical deposition.
The basic process of electrodeposition in preparing WO3 thin films is: first, dissolve the W powder in a certain proportion with H2O2, then remove the excess H2O2, get the electrolyte solution and deposit it naturally, then use Pt as the working electrode and the other as the counter electrode. The WO3 thin film can be obtained on the Pt electrode by the electrodeposition of the current. Some scholars have used this method to prepare WO3 films on the surface of Ti matrix. The basic process is as follows: first, add 2G tungsten powder to H2O2 of 10 m L 30%, and then add 100mL distilled water and 30m L propanol after the exothermic reaction is finished, then get the electrolyte solution needed to prepare WO3 film. Using a saturated calomel electrode as the counter electrode at room temperature to 450 m V voltage electrolysis for 1 hours, the product repeatedly washed with distilled water and ethanol, and after appropriate heat treatment, you can get WO3 thin film on a substrate.
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